Lester A. D'Cruz

Awarded Patents 

Assignee: Applied Materials, Inc

  1.       US Patent No. 7,777,197: Vacuum reaction chamber with x-lamp heater.
  2.       US Patent No. 7,611,996: Multi-stage curing of low K nano-porous films.
  3.       US Patent No. 7,547,643: Techniques promoting adhesion of porous low K film to underlying barrier layer.
  4.       US Patent No. 6,664,202: Mixed frequency high temperature nitride CVD process.

(see all Applied Materials experience)