Awarded Patents
Assignee: Applied Materials, Inc
co-inventor
(see all Applied Materials experience)
co-inventor
- US Patent No. 7,777,197: Vacuum reaction chamber with x-lamp heater.
- US Patent No. 7,611,996: Multi-stage curing of low K nano-porous films.
- US Patent No. 7,547,643: Techniques promoting adhesion of porous low K film to underlying barrier layer.
- US Patent No. 6,664,202: Mixed frequency high temperature nitride CVD process.
(see all Applied Materials experience)